It is amazing that Ducharme's straightforward claims should create so much misunderstanding. Let me restate his claims:
(1) LB films currently tested 400J/cc => 200J/cc device level with 50% fill factor
(2) same films but with high k nanoparticles => 520J/cc or 260J/cc device level (50% fill factor) expected not tested.
This is consistent with his claims that he can do better than 400J/cc dielectric ED,
These values are very high, but reasonable. They are from very thin films, which allow ultra-high fields at relatively low k. This is the recipe for high ED.
Eestor say very little, but we know what they have is nothing like Ducharme. His results have NO RELEVANCE for Eestor. They are understandable given current physics.
In fact we know Eestor dielectric has k=22500 at 0V and that the operating field is around 350V/um These two facts mean that (acording to conventional physics) it won't work. Ducharme's work is all about X10 field and /1000 k.
The fact that some Eestor believers hunt around for anything regardless of whether it is relevant to Eestor indicates the high level of speculation necessary to be an eestor believer. Nothing wrong with that, but whereas Daniel's ideas are at least attempting to explain what IS known about Eestor - imagining link with Ducharme work is even more farfetched.
Daniel's ideas break on one of two issues:
Either - they invoke IBLC effect in situations where the barriers have unreasonably high fields (basically, as all reserchers know and is obvious from first principles, IBLC is not a route to high ED).
Or - they suppose configurations of charges which cannot be generated from the known external field
Best wishes, Tom
Assumptions: 1) E=1/2CV2
(Only dummies assume this)